Inorganic Phosphors and ACTFEL Devices on Flexible Plastic
Inorganic Phosphors and ACTFEL Devices on Flexible Plastic Substrates J. P. Bender and J. F. Wager Department of Electrical Engineering and Computer Science http://ece.oregonstate.edu/matdev S. Park, B. L. Clark, and D. A. Keszler Department of Chemistry Oregon State University Corvallis, Oregon USA 97731-3211 Organization 1. Hydrothermal annealing
overview 2. Hydrothermally annealed Zn2GeO4 3. Zn2GeO4:Mn on flexible plastic substrates 4. Conclusions Hydrothermal AnnealingModification of conventional hydrothermal dehydration technique Substrate is sealed in a Teflon-lined reaction
vessel with water and heated Material is repeatedly dissolved and redeposited, causing crystalline grain growth Refractory oxide films crystallized using this technique include MnO2, ZrO2, Zn2SiO4, and Zn2GeO4 Hydrothermal Annealing of rf Sputtered Zn2GeO4:Mn Zn2GeO4:Mn ACTFEL devices
with L40 > 100 nits @ 60 Hz and CIEx,y = 0.300,0.667 have been demonstrated Hydrothermal annealing is possible due to small solubility of Zn2GeO4 in water Hydrothermally Annealed Zn2GeO4:Mn Annealed film roughness can be controlled from Rq ~ 10
nm to ~ film thickness by adjusting anneal temperature, time, and amount of water added Hydrothermally Annealed Zn2GeO4:Mn PL emission observed: 125 C for hydrothermal anneal
625 C for furnace anneal Approximately equal PL intensity: 200 C, 2 hrs for hydrothermal anneal 680 C, 2 hrs for furnace anneal Zn2GeO4:Mn films on Plastic Substrates Substrate requirements: withstand 150 C withstand UV & O radicals withstand exposure to H2O retain dimensions and flexibility
Three plastics successfully employed: polypropylene Kapton polyimide Appear 3000 Kapton Polyimide Tg > 360 C Chemically very stable Relatively low CTE Deep amber or black color Dupont Kapton 500HPP-ST preferred for better thinfilm adhesion Bright PL from
Inorganic Phosphor on Flexible Substrate Hydrothermally annealed Zn2GeO4:Mn film shows bright green photoluminescence Polyimide film may be bent moderately without cracking or delamination of film Inverted ACTFEL Device
ITO (320 nm) SiO2 (300 nm) Zn2GeO4:Mn (500 nm) Ti adhesion/contact (100 nm) Polyimide film (5 mils) Appear 3000 Clear plastic film from Promerus designed for display applications Less attractive than polyimide films in many respects, but: 92%
transparent Normal ACTFEL Device Al (320 nm) Zn2GeO4:Mn (500 nm) SiO2 (300 nm) Ti adhesion (10 nm) ITO (160 nm) Ti adhesion (10 nm) Appear 3000 film (5 mils) Conclusions Thin-films of crystalline refractory oxides have been deposited on flexible plastic substrates
Operational ACTFEL devices have been fabricated on flexible plastic, exhibiting dim EL Further work is needed to improve performance: Better low temperature dielectric Improved performance from hydrothermally annealed Zn2GeO4:Mn Investigation of hydrothermal annealing for other oxide phosphors Acknowledgement s This work was supported by the National Science Foundation
under Contract Nos. DMR0071899 and DMR-0071727. Kellie Schmitt of DuPont, Joe McDaniel of Promerus, and Ivo Thys of AFGA provided plastic film samples for evaluation. Materials Properties Young CTE s (ppm/ modulu C)
s (GPa) Tg (C) Kapton 500HPP-ST polyimide 2.8 (20) 360410
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